SK hynix Reportedly Advancing EUV Process, Begins Introducing New Material PSM

According to ZDNET, SK hynix is pushing forward with its extreme ultraviolet (EUV) lithography technology to enable mass production of next-generation DRAM. The company introduced its first high-numerical-aperture (High-NA) EUV equipment last year and fully commenced R&D on the related technology this year. It is reported that the company has now fully begun introducing PSM (phase-shift mask) to enhance EUV lithography performance.