Samsung Reportedly Plans to Apply High-NA EUV Technology to 1nm Process Mass Production

According to South Korean media reports, Samsung Electronics stated that from a technical perspective, high-numerical-aperture extreme ultraviolet (High-NA EUV) lithography technology still requires further improvement for application in 2nm and 1.4nm process mass production. However, the technology will become a necessity for 1nm-class processes, so the company is currently collaborating with other partners on joint R&D for High-NA EUV technology. It is reported that Samsung plans to mass-produce its 1.4nm (SF1.4) process in 2029, and begin mass production of SF1.4+ (an improved version of the 1.4nm process) and the 1nm process in 2030.