According to South Korean media reports, Samsung Electronics has ordered over 70 lithography machines for PH1, the first phase of the P5 fab cluster at its Pyeongtaek semiconductor production site, in preparation for the operation in 2027. These lithography machines required for Pyeongtaek P5 PH1 are from ASML and Canon, with approximately 20 of them being ASML's EUV exposure systems. P5 PH1 will be used for 1c-nm process DRAM production, manufacturing both general-purpose memory and HBM. Samsung Electronics is expected to begin installing patterning equipment for Pyeongtaek P5 PH1 starting in the second quarter of 2027, at which time the cleanroom construction for this phase will also be completed. The phase is expected to contribute production capacity within 2027, meeting the demands for NVIDIA's "Rubin" and other AI XPUs, and alleviating the current tight supply situation in the DRAM market.