ASML Achieves 1000-Watt Breakthrough in EUV Lithography Light Source Power, Expected to Increase Chip Capacity by 50% by 2030

On February 23rd local time, ASML announced a major breakthrough in its extreme ultraviolet (EUV) lithography light source technology, successfully increasing the power of its light source from 600 watts to 1000 watts. Higher power can significantly shorten chip exposure time, thereby increasing the wafer throughput per hour and reducing the cost per chip. ASML stated that by 2030, the upgraded equipment will be able to process approximately 330 wafers per hour, a 50% increase from the current 220. Depending on the chip size, each wafer can produce hundreds to thousands of chips, meaning that total chip capacity is expected to increase by up to 50%.